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Ion Source with Hall Electron Drift

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МИНИСТЕРСТВО ОБРАЗОВАНИЯ И НАУКИ РОССИЙСКОЙ ФЕДЕРАЦИИ

федеральное государственное автономное образовательное учреждение высшего образования

«Национальный исследовательский Томский политехнический университет»

 

Институт Физико-технический

Кафедра Экспериментальной физики

Направление, специальность Техническая физика

 

 

Отчет по лабораторной работе № 1

«Voltage- Current Characteristics of Plasma Sources»

по дисциплине «Профессиональная подготовка на английском языке»

 

Выполнили студенты гр. _0ДМ51_. ______________ Спатаев К.А

№ группы подпись ФИО

______________

дата

 

Проверил ассистент каф. ЭФ ______________ Д.В. Сиделёв

подпись

______________

дата

 

Томск – 2015

The purpose is to study operation modes of plasma sources and definition optimal work characteristics.

 

Theoretical Part

The operation principle of magnetron sputtering system is based on sputtering material by high-energy ions (0.2-0.7 keV). The gas are ionized in crossed electrical and magnetic fields and accelerated in the direction of target. The sputtering particles have energy 1-10 eV and condense on oppositely directed substrate at 10-2-10-1 Pa.

Dual magnetron sputtering system (Fig. 1) is consisted of two planar magnetrons (2) in one framework (1). The insulators are necessarily ceramic (6). Each of the magnetron is consisted of body, permanent magnets (5) and magnetic circuit (4), target (3). Magnetic shunt (7) is between side magnets and body walls of magnetron. The main framework (1) is used for preventing breakdown of magnetron sputtering (dishonorable discharge).

Power supply of dual magnetron is alternative current. In the first part of work period, the first planar magnetron has a negative potential, the second magnetron has positive potential. Then, polarity reversal is occurred. For this reason, targets alternately are sputtering and have an anode function. This construction of magnetrons (dual) has a higher productivity than traditional types of magnetrons (planar direct current magnetrons).

The magnetron sputtering discharge is used to coatings deposition in gas environment (predominantly argon). In last time, the high power pulsed magnetron sputtering systems are perspective to deposition of metal coatings.

Fig. 1.The scheme of dual magnetron sputtering system.

Ion Source with Hall Electron Drift

 

The operation principle of ion source is based on generation of high-density plasma. Glow discharge plasma forms in crossed electrical and magnetic fields. Then positive ions are extracted from volume discharge by means of positive potential and acceleration by electrical field.

The metal walls have cathode potential. The radial magnetic field is formed in annular gap and decreased near anode. The magnetic field mainly has a transverse field component, electric field – longitudinal field component.

Plasma electrons drift in azimuthal direction by Lorentz force in crossed magnetic (B) and electrical (E) fields. As a result, electric layer are formed in the annular gap. Electrons mobility across the magnetic field is limited and external electric field accelerate ions along axis of the system.

Fig. 2. The scheme of ion source.

Operation parameters of ion source:

Work gases Ar, O2, (Ar+ O2), N2, H2
Operation voltage, V 500 – 3500
Average ion energy, eV 250-1725
Linear density of ion current (Ion mode), mA/sm 0.1 – 3
Work pressure, Pa 0.05 – 0.25

Experimental Part

Results:

P=0.1Pa

U I
  1.07
  0.86
  0.66
  0.51
  0.39
  0.30
  0.22
  0.16

P=0.2Pa

 

U I
  1.58
  1.22
  0.94
  0.70
  0.55
  0.42
  0.31
  0.24

 

P=0.3Pa

U I
  1.49
  1.18
  0.97
  0.71
  0.57
  0.45
  0.36
  0.27

 

Conclusion


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